A new vacuum deposition equipment dedicated to thin film deposition which combines magnetron sputtering, Plasma Enhanced Chemical Vapor Deposition (PECVD), and arc deposition sources. Several research and development programs could benefit to hydrogen, nuclear, tribology, and energy fields.
- Two chambers with adjustable, measures
- The machine can support axial loads of up to three tons, making it unique in its kind.
- The arc is composed of two central cathodes and two additional cathodes at the ends.
- The first vacuum deposition machine for industrial world
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